Chemical Deposition Methods
- Overview of Chemical Vapour Deposition
- CVD Reactors and Delivery System Technology
- Modeling CVD Processes
- Atomic Layer Deposition
- Basic Chemistry of CVD and ALD Precursors
- CVD of III-V Compound Semiconductors
- Chemical Vapor Deposition of Metals: W, Al, Cu and Ru
- Chemical Vapour Deposition of Metal Oxides for Microelectronics Applications
- Metal-organic Chemical Vapour Deposition of Refractory Transition Metal Nitrides
- CVD of Functional Coatings on Glass
- Photo-assisted CVD
- Plasma Enhanced Chemical Vapour Deposition Processes
- Commercial Aspects of CVD
- Characterization Techniques for CVD Films
•X-ray Diffraction (XRD)
•Scanning Electron Microscopy (SEM)
•Transmission Electron Microscopy (TEM)
•Atomic Force Microscopy (AFM)
•Raman Spectroscopy
•Fourier Transform Infrared Spectroscopy (FTIR)
•Ellipsometry
•X-ray Photoelectron Spectroscopy (XPS)
•Energy Dispersive X-ray Spectroscopy (EDX)
•Secondary Ion Mass Spectrometry (SIMS)
•Spectroscopic Ellipsometry
•Thermal Gravimetric Analysis (TGA)
•Profilometry